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红外窄带滤光片采用多膜系结构，通过精密镀膜工艺制备的只允许特定波长、特定带宽的光线透过的滤光片，主要用于红外气体检测、荧光分析等领域。
分享：
精密镀膜工艺制备
红外窄带滤光片采用多膜系结构，通过精密镀膜工艺制备
保证特定气种的检测精度
多膜系结构，保证特定带宽、波长光线通过，保证特定气种的检测精度
Specifications
|
Description
|
5020NBP-240
|
|
Center Wavelength
|
5020±40nm
|
|
Half-peak Width
|
240±20nm
|
|
Peak transmittance
|
≥85%
|
|
Blocking
|
1500-11000nm
|
|
Substrate
|
CZ-Si
|
|
Thickness
|
0.5mm
|
|
Size
|
100±0.2mm dia
|
|
Clear Aperture
|
98mm dia
|
|
Coating Method
|
Electron Beam
Depostion
|
Specifications
|
Description
|
4480BPF-620
|
|
Center Wavelength
|
4480±70nm
|
|
Half-peak Width
|
620±60nm
|
|
Peak transmittance
|
≥85%
|
|
Blocking
|
1500-11000nm
|
|
Substrate
|
CZ-Si
|
|
Thickness
|
0.5mm
|
|
Size
|
100±0.2mm dia
|
|
Clear Aperture
|
98mm dia
|
|
Coating Method
|
Electron Beam
Depostion
|
Specifications
|
Description
|
3900NBP-138
|
|
Center Wavelength
|
3900±50nm
|
|
Half-peak Width
|
138±15nm
|
|
Peak transmittance
|
≥85%
|
|
Blocking
|
1500-11000nm
|
|
Substrate
|
CZ-Si
|
|
Thickness
|
0.5mm
|
|
Size
|
100±0.2mm dia
|
|
Clear Aperture
|
98mm dia
|
|
Coating Method
|
Electron Beam
Depostion
|
Specifications
|
Description
|
4260NBP-180
|
|
Center Wavelength
|
4260±40nm
|
|
Half-peak Width
|
180±20nm
|
|
Peak transmittance
|
≥85%
|
|
Blocking
|
1500-11000nm
|
|
Substrate
|
CZ-Si
|
|
Thickness
|
0.5mm
|
|
Size
|
100±0.2mm dia
|
|
Clear Aperture
|
98mm dia
|
|
Coating Method
|
Electron Beam
Depostion
|
Specifications
|
Description
|
3400NBP-180
|
|
Center Wavelength
|
3400±50nm
|
|
Half-peak Width
|
180±20nm
|
|
Peak transmittance
|
≥85%
|
|
Blocking
|
1500-11000nm
|
|
Substrate
|
CZ-Si
|
|
Thickness
|
0.5mm
|
|
Size
|
100±0.2mm dia
|
|
Clear Aperture
|
98mm dia
|
|
Coating Method
|
Electron Beam
Depostion
|
Specifications
|
Description
|
10600NBP-240
|
|
Center Wavelength
|
10600±100nm
|
|
Half-peak Width
|
240±50nm
|
|
Peak transmittance
|
≥70%
|
|
Blocking
|
2000-18000nm
|
|
Substrate
|
CZ-Si
|
|
Thickness
|
0.5mm
|
|
Size
|
100±0.2mm dia
|
|
Clear Aperture
|
98mm dia
|
|
Coating Method
|
Electron Beam
Depostion
|
发明专利证书
